The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 1986
Filed:
Dec. 06, 1984
Bernard Jacquot, Saint Egreve, FR;
Commissariat a l'Energie Atomique, Paris, FR;
Abstract
Multicharged ion source with several electron cyclotron resonance zones. The source comprises a sealed enclosure containing a gas for forming a plasma confined in said enclosure, means for producing a high frequency electromagnetic field within the enclosure, means for producing within the enclosure a group of radial and axial, local magnetic fields and defining equimagnetic surfaces permitting the confinement of the plasma on one of these surfaces, the electron cyclotron resonance condition being satisfied, the group having an axis of symmetry, means for extracting the ions through the orifice made in the wall of the enclosure and located on the axis of symmetry and means for reducing, outside the volume occupied by the plasma, the amplitude of the local axial magnetic fields in the vicinity of and slightly upstream of the extraction orifice in n zones located outside the axis, so that new ionizing electron cyclotron resonances appear in these zones.