The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 1986
Filed:
Apr. 29, 1983
Joseph A Capella, Crystal River, FL (US);
David E Fowler, Gainesville, FL (US);
Quadrex HPS, Inc., Gainesville, FL (US);
Abstract
Disclosed is a system and method for cleaning radioactively contaminated articles, including tools and like items of hardware. The system includes a cleaning chamber for receiving and sealing therein the contaminated articles, a high pressure spray gun disposed within the cleaning chamber for spraying the contaminated articles with a clean solvent to dislodge and dissolve the contaminants, and a system for decontaminating the solvent for reuse. The cleaning chamber includes a drain having the capacity to remove contaminated solvent at a rate at least as great as that at which the solvent is sprayed into the chamber, such that substantially no contaminated solvent collects in the cleaning chamber.