The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1986
Filed:
Nov. 20, 1984
Jun Yamaguchi, Hyogo, JP;
Osamu Shikatani, Hyogo, JP;
Sumitomo Electric Industries, Ltd., Osaka, JP;
Abstract
Identification of the front surface and whether the front surface has a mesa direction for wafers of compound semiconductors belonging to group III-V have a crystalline structure of the zinc blende type. The wafer has asymmetric peripheral edge with regard to a middle plane to denote the front surface. Another asymmetry as well as the edge asymmetry determines the front surface and the mesa direction on the surface. The other asymmetry is an orientation flat in a circular wafer. The asymmetry of the peripheral edge is given by the half round whose curvature changes in the direction of the thickness, two slanting parts whose lengths are different or a slanting part or a perpendicular part which are formed in succession in the direction of the thickness on the peripheral edge and so on.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile