The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 1986

Filed:

Jan. 08, 1986
Applicant:
Inventor:

Erich Plies, Munich, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin and Munich, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K / ; H05H / ;
U.S. Cl.
CPC ...
2503 / ; 250251 ;
Abstract

An apparatus for deflecting and focusing a beam of neutral particles for operating on extremely small workpieces, such as for doping or inscribing micro-electronic components, has a deflection system for generating at least one magnetic field through which the beam of neutral particles is directed for focusing and shaping of the beam on the workpiece. The lens system may include one or more six-pole or eight-pole lenses.


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