The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 16, 1986

Filed:

Sep. 30, 1985
Applicant:
Inventor:

Theodorus G van Oirschot, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
148171 ; 148172 ; 2956 / ;
Abstract

A method of manufacturing a semiconductor device, in which an epitaxial layer doped with magnesium compounds of elements from the groups III and V of the periodic system of elements is deposited on a surface of a semiconductor body. For this purpose, the semiconductor body is brought into contact with a saturated solution of the compound, in which magnesium is present. Magnesium is added to the solution in the form of magnesium silicide, magnesium germanide or magnesium stannide. Thus, the epitaxial layer can be doped in a very reproducible manner, while moreover defects in the layer due to magnesium oxide particles are prevented.


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van Oirschot, Theodorus. (1986). Forming magnesium-doped group iii-v semiconductor layers by liquid phase (U.S. Patent No. 4629519). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4629519

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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