The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 1986
Filed:
Mar. 25, 1985
Applicant:
Inventor:
Osamu Kamiya, Machida, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118724 ; 118723 ; 118620 ; 118641 ; 118 501 ;
Abstract
A photochemical vapor deposition apparatus which includes a reaction chamber, a means for introducing a starting gas for film formation into the reaction chamber and a means for irradiating the starting gas with a light of high energy and deposites a thin film on a substrate placed in the reaction chamber by utilizing the photochemical reaction, characterized in that the apparatus includes a means for heating in advance to high temperature the starting gas to be introduced into the reaction chamber.