The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 1986

Filed:

Sep. 18, 1985
Applicant:
Inventor:

Allen H Greenleaf, Pownal, ME (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
51119 ; 5110 / ; 5120 / ;
Abstract

A rotary lapping system and process is disclosed for producing a controlled pressure gradient, including positive and negative lift, when lapping a workpiece coated with an abrasive slurry liquid with a plurality of grinding pads mounted beneath a rotating lap substrate. To obtain positive and negative lift, the grinding pads are tilted with respectively a positive and negative angle of attack, which hydrodynamically reacts with the abrasive slurry liquid to produce the desired lift. The controlled pressure gradient is further varied by decentering the rotation of lap substrate.


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