The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 1986

Filed:

Dec. 06, 1984
Applicant:
Inventors:

Hiromichi Imahashi, Hitachi, JP;

Masahisa Inagaki, Hitachi, JP;

Kimihiko Akahori, Katsuta, JP;

Hajime Umehara, Hitachi, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21D / ; B23P / ;
U.S. Cl.
CPC ...
29516 ; 295277 ; 164469 ; 164494 ; 164495 ;
Abstract

A high-purity metal member is produced by charging raw material such as sponge zirconium into a cavity of a mold such as a hearth under a vacuum atmosphere; irradiating the material with electron beams to melt it at a limited area of the cavity while forming a molten metal pool and irradiating the pool with the electron beam thereby elevate the molten metal pool to evaporate away impurities therein; and shifting the mold relative to the electron beams to provide a high-purity metal member. The metal pool is limited in its size and irradiated high energy density electron beams so that the temperature is raised whereby the impurities are easily evaporated away. The mold may have an annular cavity. In case of high-purity sleeve formation, the electron beams are irradiated onto the raw material while rotating the mold so that melting and solidification appear in a circumferential direction to be repeated. The impurities are repeatedly exposed to the electron beams.


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