The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1986
Filed:
Feb. 04, 1985
Applicant:
Inventor:
Wolfgang Dahms, Berlin, DE;
Assignee:
Schering Aktiengesellschaft, Berlin and Bergkamen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
427-8 ; 204 521 ; 427 10 ;
Abstract
In a method for an automatic control of the galvanic deposition of copper coatings in acid copper bath by measuring a maximal current density and a continual dosing of gloss additives to the bath, the maximal current density is measured by cyclically measuring an actual voltage in the bath and compensating for eventual deviations of the actual voltage from the nominal value by an automatic dosing of the additives by means of dosing devices.
Dahms, Wolfgang. (1986). Method for automatic control of galvanic deposition of copper coatings (U.S. Patent No. 4624857). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4624857
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile