The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 25, 1986
Filed:
Jul. 12, 1985
Applicant:
Inventors:
Raymond T Westfall, Seminole, FL (US);
Erich J Feldl, Seminole, FL (US);
Assignee:
E. T. Plasma, Inc., Gulfport, FL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156345 ; 156646 ; 156902 ; 204298 ; 20419232 ;
Abstract
A method and apparatus are disclosed for continuous plasma etching of generally planar workpieces in which the workpieces are introduced into an evacuated chamber containing the plasma, are carried along a continuous processing path and are removed therefrom. The plasma is generated within the chamber and the workpieces are supported within an electrically neutral field within the processing plasma.