The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 1986
Filed:
Feb. 08, 1985
Hitachi, Ltd., Tokyo, JP;
Abstract
A process and apparatus for recovering a high-purity inert gas by removing the impurities in a used inert gas (e.g., Ar), comprising a combustible component reaction step and reaction unit for adding oxygen to a raw gas containing a carbonaceous combustible component to thereby react the combustible component in said raw gas with the oxygen; a carbon dioxide gas removing step and removing unit for removing the carbon dioxide in the raw gas sent from said combustible component reaction unit; an oxygen reaction step and reaction unit for adding hydrogen to the raw gas after the carbon dioxide gas removal to react the oxygen remaining in said raw gas with the hydrogen; a moisture removing step and removing unit for removing the moisture in the raw gas sent from the oxygen reaction unit; and a refining step and refining unit for removing the remaining impurities from the raw gas after the moisture removal to recover a high-purity inert gas.