The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 1986
Filed:
Mar. 04, 1985
Colin M Reed, Manchester, GB;
National Research Development Corp., London, GB;
Abstract
A process in which material (20) is passed effectively continuously through a gaseous treatment chamber (10) by way of at least one open port (12) is improved by applying gas curtains across the material path to form externally adjacent the port a buffer zone (50) between the chamber interior and the surrounding atmosphere, which zone acts generally to balance the gaseous outflow otherwise occurring through the port. The buffer zone is preferably formed by and between two curtains serially spaced nearer to and further from the port, the curtains being respectively formed with gas drawn from without and within the zone. The zone is suitably sustained in varying conditions by control of curtain flow rate in response to a zone parameter such as temperature.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile