The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 11, 1986

Filed:

May. 15, 1984
Applicant:
Inventors:

Yukihiro Izumida, Mobara, JP;

Kazuo Majima, Mobara, JP;

Hidemasa Komoro, Chiba, JP;

Masakatsu Horiuchi, Mobara, JP;

Mamoru Ikeda, Mobara, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
313414 ;
Abstract

An electron gun for color picture tube has a focusing electrode and an anode electrode respectively formed of an oval thick plate for forming main focusing lenses. Each of the focusing electrode and anode is formed with three electron beam passing holes arranged in line in a direction orthogonal to a tube axis of the picture tube. The focusing electrode and the anode are arranged to oppose each other with a distance therebetween such that their corresponding electron beam passing holes oppose each other. When predetermined voltages are applied to the focusing electrode and anode, main lenses are formed between the respective opposing holes. As viewed along the tube axis, the in line electron beam passing holes of each electrode include two outer electron beam passing holes each having an outer half in the form of a semi-circle and an inner half in the form of a semi-ellipse having a diameter of the semi-circle as its major axis and a central electron beam passing hole in the form of an ellipse having a major axis which is equal to the diameter of the semi-circle and which extends in a direction orthogonal to the direction of arrangement of the electron beam passing holes.


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