The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 1986
Filed:
Feb. 06, 1986
Applicant:
Inventors:
Nobutaka Matsuo, Nagano, JP;
Yoshitaka Itoh, Nagano, JP;
Sadao Kanbe, Nagano, JP;
Haruo Osafune, Nagano, JP;
Masanobu Motoki, Nagano, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C03B / ;
U.S. Cl.
CPC ...
65 181 ; 65 17 ; 264 66 ;
Abstract
A method for preparing high quality silica glass articles is provided. The glass is prepared by hydrolyzing silicon alkoxide with a basic reagent to yield a first solution, hydrolyzing a silicon alkoxide with an acid reagent to yield a second solution, mixing the first solution with the second solution at a predetermined mixing rate to yield a sol solution, pouring the sol solution into a container, gelling the sol solution to a wet gel, drying the wet gel to a dry gel, and sintering the dry gel to yield a silica glass.