The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 04, 1986

Filed:

Nov. 15, 1985
Applicant:
Inventor:

Clark Bergman, Roseville, MN (US);

Assignee:

Multi-Arc Vacuum Systems, Inc., St. Paul, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 118503 ; 118730 ; 204298 ; 427 37 ; 427 38 ; 427 39 ;
Abstract

An improved method and apparatus for maintaining cathode spots in an electric arc vapor deposition coating process, on the desired cathode evaporation surface are disclosed. A primary anode is arranged, configured and biased within a vacuum deposition coating chamber relative to a cathodic source so as to maintain an electric arc therebetween. A relative biasing network maintains a voltage difference during deposition between the primary anode and other conductive surfaces within the chamber, or the chamber wall itself, such that electrons leaving the cathode are preferentially drawn toward the primary anode rather than to other conductive surfaces. The anode orientation within the chamber causes those electrons drawn toward it to tend to maintain the cathode spots on the desired cathode evaporation surface for maintaining arc stability at low arc current levels.


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