The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 1986
Filed:
Apr. 12, 1985
Applicant:
Inventors:
Carl O Bozler, Sudbury, MA (US);
Daniel J Ehrlich, Lexington, MA (US);
Jeffrey Y Tsao, Albuquerque, NM (US);
Assignee:
Massachusetts Institute of Technology, Cambridge, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
430942 ; 430270 ; 430276 ; 430311 ; 430325 ; 430330 ; 430945 ; 430967 ; 156628 ;
Abstract
A negative resist and masking process for microfabrication comprising an evaporated film of aluminum and oxygen which, in the as-deposited state, is highly conductive and has low resistance to etching, but when exposed to active radiation, such as by pulse laser thermal excitation, converts to a low electrical conductivity, high etchant resistive phase.