The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 1986
Filed:
Nov. 17, 1983
Rainer Schlecker, Bissersheim, DE;
Peter Schmidt, Weisenheim, DE;
Peter C Thieme, Wachenheim, DE;
Dieter Lenke, Ludwigshafen, DE;
Hans-Jurgen Teschendorf, Dudenhofen, DE;
Martin Traut, Heidelberg, DE;
Claus D Mueller, Viernheim, DE;
Hans P Hofmann, Limbergerhof, DE;
Horst Kreiskott, Wachenheim, DE;
BASF Aktiengesellschaft, Ludwigshafen, DE;
Abstract
Sulfonates of hydroxycoumarins of the formula I ##STR1## where R.sup.1 and R.sup.2 are identical or different and are each hydrogen, halogen or alkyl of 1 to 5 carbon atoms which can be substituted by --NR.sup.4 R.sup.5, --OR.sup.4 or --OC(O)R.sup.4, where R.sup.4 and R.sup.5 are identical or different and are each hydrogen or alkyl of 1 to 4 carbon atoms, or R.sup.1 and R.sup.2 are each a carboxylic acid group --OC(O)R.sup.4 or a carboxamido radical, with the proviso that R.sup.1 is not methyl when R.sup.2 is hydrogen, or R.sup.1 and R.sup.2 together form a --(CH.sub.2).sub.n -- chain where n is 3-5, and R.sup.3 is a straight-chain or branched alkyl radical of 1 to 8 carbon atoms or cycloalkyl of 3 to 8 carbon atoms, each of which can be substituted by halogen, --OR.sup.4, --NR.sup.4 R.sup.5, --CN or phenyl, or R.sup.3 is a straight-chain or branched alkenyl radical of 3 to 8 carbon atoms, an amino group -- NR.sup.4 R.sup.5, or phenyl or naphthyl, each of which is unsubstituted or monosubstituted or polysubstituted by --OR.sup.4, --NR.sup.4 R.sup.5, --NO.sub.2, halogen, --SR.sup.4, --S(O)R.sup.4, --OS(O)R.sup.4, --SCF.sub.3, --OS(O)CF.sub.3, --CN, --C(O)R.sup.4, --OC(O)R.sup.4, --NHC(O)R.sup.4, --CF.sub.3, C.sub.1 -C.sub.4 -alkyl or a combination of these substituents, a process for their preparation, drugs containing these compounds, and compounds of the formula I, in which R.sup.1 is methyl and R.sup.2 is hydrogen, for use as drugs.