The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 21, 1986
Filed:
May. 07, 1985
Rajender K Sadhir, Plum, PA (US);
Westinghouse Electric Corp., Pittsburgh, PA (US);
Abstract
Disclosed is a method of making a capacitor winding by exposing a plasma polymerizable vapor of an organometallic compound to a plasma, moving a polymeric substrate beneath the plasma-exposed polymerizable organometallic vapor at a speed such that the metallic element in the organometallic vapors is deposited on the polymeric substrate to form a conducting layer, and carbon from the organic portion of the organometallic vapor is deposited on top of the conducting layer as a pinhole free highly cross-linked polymeric film. The substrate is then wound on a spool to form the capacitor winding. Also disclosed is apparatus useful for making the capacitor winding which consists of a substantially gas-tight reactor, a pay-out spool containing a wound-up organic polymeric substrate, a take-up spool positioned so that the substrate can move from the pay-out spool to the take-up spool unimpeded, and means for moving the substrate from the pay-out spool to the take-up spool. A monomer inlet is provided for admitting a vaporous monomer into the reactor over the substrate as it moves from the pay-out spool to the take-up spool and an effluent outlet is provided for drawing gases out of the reactor. A valve controls the admission of the monomer to the inside of the reactor and a vacuum pump applies a vacuum to the effluent outlet. A pressure gauge measures the vapor pressure inside the reactor and a radio frequency generator generates a plasma over the substrate as it moves from the pay-out spool to the take-up spool.