The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 1986
Filed:
Apr. 16, 1985
Applicant:
Inventors:
Assignee:
Chisso Corporation, Ohsaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430326 ; 430270 ; 430296 ; 430331 ;
Abstract
A process for forming a detailed image having a high sensitivity to far-UV light and capable of giving a positive type image with a high precision is provided, which process comprises applying onto a base a resist solution comprising an organic solution, of a homopolymer of methyl vinyl ketone or a copolymer thereof with a comonomer of the formula R.sup.1 R.sup.2 C.dbd.CH.sub.2 wherein R.sup.1 is H or --CH.sub.3 and R.sup.2 is acetoxy, nitrile, unsubstituted or substituted aryl or ##STR1## wherein R.sup.3 is alkyl, to form a coating on the base; irradiating far-UV light; developing the coating with a developer composed mainly of a cellosolve compound; and rinsing or/and washing the resulting material.