The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 1986
Filed:
Jul. 18, 1984
Jean-Pierre Serrano, St. Aubin-de-Medoc, FR;
Jean Feuillerat, Bordeaux, FR;
Societe Nationale Industrielle Aerospatiale, Paris, FR;
Abstract
The invention relates to a process and device for injecting at least one stream of a finely divided material into a hot gaseous flow, such as a plasma jet. According to the invention,--there is interposed on the path of said hot gaseous flow a screen pierced with a plurality of orifices spatially distributed about said hot gaseous flow so as to fractionate the latter into a plurality of elementary flows at least approximately in the same general direction; and--said stream of finely divided material, is led to at least one nozzle at least partially surrounded by said orifices, in order to create at least one stream of finely divided material whose direction is at least approximately similar to that of said elementary hot gaseous flows and surrounded by at least certain of them. The invention is particularly applicable to plasma chemistry.