The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 1986
Filed:
Sep. 18, 1985
Reinhard Behn, Munich, DE;
Rudolf Wittmann, Heidenheim, DE;
Siemens Aktiengesellschaft, Berlin & Munich, DE;
Abstract
A method for the manufacture of electrical plasma-polymer multilayer capacitors wherein alternate layers of thin metal conductors and dielectric layers produced by radiation polymerization are deposited on a substrate, after which the portions of the metal layers to which electrical contact is to be made are etched, preferably by sputter etching, to remove oxides therefrom. Then, contact layers are applied to the opposite end faces of the substrate to provide electrical connections for the portions of the metal layers which have been etched, the contact layers consisting of the sequence (1) an aluminum layer, (2) a nickel layer, and (3) a palladium layer.