The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 1986
Filed:
Aug. 07, 1985
Applicant:
Inventors:
David H Tracy, Norwalk, CT (US);
Paul G Saviano, Norwalk, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ;
U.S. Cl.
CPC ...
156345 ; 156626 ; 156643 ; 20419232 ; 204298 ;
Abstract
Pressurized gas is applied between a wafer and electrode in a plasma etching system. Gas between the wafer and electrode provides cooling of the wafer. A control arrangement maintains the gas at a predetermined pressure.