The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 07, 1986
Filed:
May. 24, 1984
William G Fateley, Manhattan, KS (US);
D.O.M. Associates, Inc., Manhattan, KS (US);
Abstract
An improved masking device for optical-type radiations (e.g., infrared visible or ultraviolet) is provided and employed in improved optical apparatus, such as spectrometers, requiring alterable radiation masking. The masking device involves no movable parts, is adapted to operate in a fixed position and has radiation transmission and/or reflection characteristics which are selectively alterable merely by controlling electrical excitation applied to the device. The masking device typically has a plurality of separated and predisposedly offset, coplanar zones of solidified, electrooptically active material carried upon a typically transparent substrate and bounded by areas of an opaque material. The active material may be any of the crystalline or polycrystalline materials which have the property of changing their optical characteristic between being relatively transmissive and being relatively reflective and/or opaque for radiations of the wavelengths of interest, in response to alterations in the magnitude of electrical current passing through the material; for example, diachromic compounds such as vanadium dioxide, certain other transition metal compounds and certain organometallic complex compounds. The masking device can be rapidly altered by electrical control to accommodate computerization techniques and Hadamard transforms or analogous mathematical techniques of spectral analysis.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile