The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 1986
Filed:
Oct. 31, 1984
James E Guillet, Don Mills, CA;
Allied Corporation, Morris Township, Morris County, NJ (US);
Abstract
A novel class of copolymeric negative photoresists is provided whose sensitivity is based upon the presence of .alpha.-chloro ketone moieties. The general structure for the monomers from which the copolymers can be formed is: ##STR1## where R is a substituent selected from 1 to 6 carbon alkyl and halogen substitutes alkyl, phenyl, and halogen substituted phenyl and napthyl and the comonomers are comonomers selected from the group consisting of 1-4 carbon alkyl acrylates and methacrylates, styrene vinyl toluene and vinyl acetate and may include additionally other comonomers that are compatible and have the polymerizable >C.dbd.C< group. The copolymers form crosslinked networks and provide useful negative photoresists which are sensitive in the ultraviolet wavelength range of between about 200 nm to 300 nm. When used in negative photoresist compositions, these chloro vinyl methyl ketone containing compounds produce a high resolution and thus higher information density in microcircuits manufactured using these photoresists.