The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1986
Filed:
Sep. 17, 1984
Applicant:
Inventors:
Wayne T Whitney, Oxon Hill, MD (US);
Hiroshi Hara, Funabashi, JP;
Assignee:
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372 33 ; 372 55 ; 372 60 ; 3314 / ;
Abstract
An improved method and apparatus for producing high power, high efficiency pulsed TEA laser energy at N.sub.2 O wavelengths by suppressing discharge arc formation with H.sub.2 or CO that is added to the N.sub.2 O lasing medium. Energy loading levels up to in the range of 266 J/L atm are achieved with gas mixtures of N.sub.2 lasing mediums and H.sub.2 or CO additives comprising N.sub.2 O:He:N.sub.2 :H.sub.2 ::0.03:0.69:0.27:0.01 and N.sub.2 O:He:N.sub.2 :CO::0.03:0.66:0.26:0.05 mole fraction.