The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 16, 1986

Filed:

Jul. 22, 1985
Applicant:
Inventors:

David J Steklenski, Rochester, NY (US);

Philip L Keogh, Pittsford, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430523 ; 430527 ; 430531 ; 430536 ; 430961 ;
Abstract

A polymer blend comprising cellulose nitrate and a polymer characterized in that (a) the polymer comprises at least 70 weight percent of polymerized recurring units derived from a hydrophobic monomer selected from the group consisting of styrene, alkyl acrylates and alkyl methacrylates and 10 to 24 weight percent of polymerized recurring units derived from an acid monomer selected from the group consisting of methacrylic acid and acrylic acid; and (b) the blend comprises from 20 to 70 weight percent of cellulose nitrate and from 8 to 15 weight percent of the polymerized recurring acid monomer and is useful as a protective layer in radiation-sensitive elements.


Find Patent Forward Citations

Steklenski, David. (1986). Protective overcoat for photographic elements (U.S. Patent No. 4612279). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4612279

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…