The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 1986
Filed:
May. 13, 1985
Applicant:
Inventors:
Knut Heitmann, Wetzlar, DE;
Martin Hoppe, Wetzlar, DE;
Eckhard Schneider, Wetzlar, DE;
Andreas Thaer, Leihgestern, DE;
Assignee:
Ernst Leitz Wetzlar GmbH, Wetzlar, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430-3 ; 430322 ; 430328 ;
Abstract
A process for the production of structures by the polymerization, or fragmentation of resist layers comprising the steps of effecting an incomplete exposure of the resist layer corresponding to the pattern of the structures, and of fully developing the structure in the resist layer by ultrasonic irradiation. An acoustic microscope is preferably used for the ultrasonic irradiation, whereby the formation of the structure in the resist layer may also be observed.