The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 09, 1986
Filed:
Nov. 13, 1984
Applicant:
Inventors:
Antonius J Nicia, Eindhoven, NL;
Giok D Khoe, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
350 9612 ; 156653 ; 156656 ; 156657 ; 1566591 ; 427 93 ; 427 94 ; 430321 ; 430318 ; 430317 ;
Abstract
A method of manufacturing a geodetic-optical component is described in which non-spherical rotationally symmetrical recesses are formed in a surface of a substrate, and the surface with the recesses are covered with a planar waveguide. This technique forms the recesses in a laminated substrate having a number of layers of varying etching rates, and then etching these layers to form cup-shaped recesses.