The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 02, 1986
Filed:
Dec. 04, 1985
Masao Sasaki, Odawara, JP;
Kaoru Onodera, Odawara, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Abstract
Silver halide photographic light-sensitive material comprising a support and at least one silver halide emulsion layer thereon, said layer comprising at least one cyan coupler of Formula I, said coupler having been dispersed in said emulsion layer by use of at least one solvent of Formula II, ##STR1## wherein R.sub.1 is an alkyl radical or an aryl radical; R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 each is a radical selected from the group consisting of hydrogen, halogens, hydroxyl radical, nitro radical, cyano radical, alkyl radicals, alkoxy radicals, aryl radicals, aryloxy radicals, alkylsulfamoyl radicals, arylsulfamoyl radicals, alkyloxycarbonyl radicals, aryloxycarbonyl radicals, alkylsulfonamido radicals, arylsulfonamido radicals, alkylsulfonyl radicals and arylsulfonyl radicals, provided that when R.sub.2 is a radical selected from said alkylsulfonamido radicals, R.sub.6 also is selected from said alkylsulfonamido radicals; and Z.sub.1 is a hydrogen atom, a halogen atom, or a radical that can be split off by the reaction of said coupler with the oxidized product of an aromatic primary amine-type color developing agent, ##STR2## wherein R.sub.7 and R.sub.8 each is an alkyl radical, an alkenyl radical or an aryl radical, provided that the sum of the carbon atoms of the radicals represented by R.sub.7 and R.sub.8 is from 16 to 36.