The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1986
Filed:
Apr. 30, 1985
Hsing-Yao Chen, West Hempfield Township, Lancaster County, PA (US);
RCA Corporation, Princeton, NJ (US);
Abstract
The asymmetric beam focusing slot provides a two-part crossover of the electron beams. The slot has a length greater than the spacing between the outer apertures and a width greater than the diameter of the apertures. The screen grid also has an improved refraction lens which comprises a transversely disposed recessed portion including a substantially rectangularly-shaped central portion and substantially triangularly-shaped end parts. The refraction lens provides a compensating field between the screen grid and the main electron lens to offset any changes in the main electron lens caused by variations in the focus voltage in the main electron lens. The recessed portion has a length, extending in the plane of the electron beams, at least coextensive with the length of the slot, and a width, extending substantially orthogonal to the plane of the electron beams, substantially greater than the width of the slot. The recessed portion is surrounded by a peripheral rim which conforms to the shape of the recessed portion. The central part of the peripheral rim is remote from the center aperture, and the triangularly-shaped end parts of the rim are in proximity to the outer apertures, thereby affecting the electrostatic field in the vicinity of the outer apertures by tilting the field lines within the recessed portion.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile