The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1986
Filed:
Jul. 31, 1985
Applicant:
Inventors:
Harry W Deckman, Clinton, NJ (US);
John H Dunsmuir, Annandale, NJ (US);
Assignee:
Exxon Research and Engineering Co., Florham Park, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
4273855 ; 430327 ; 430330 ; 430347 ;
Abstract
The present invention is a method to increase the sensitivity of a positive polymer resist by control of molecular weight distribution and prebake temperature. The sensitivity of a polymer positive resist is increased by baking a narrow molecular weight fraction resist below the glass transition temperature. More particularly the sensitivity is increased by the use of low average molecular weight resist of narrow molecular weight distribution.
Deckman, Harry. (1986). Improvements in sensitivity of a positive polymer resist having a glass (U.S. Patent No. 4608281). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4608281
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile