The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 1986

Filed:

Sep. 25, 1985
Applicant:
Inventors:

Roy M Griswold, Hudson, MI (US);

Walter L Magee, Adrian, MI (US);

Paul A Manis, Allentown, PA (US);

Eugene R Martin, Onsted, MI (US);

Assignee:

SWS Silicones Corporation, Adrian, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 541 ; 427 55 ; 428447 ; 428450 ; 428452 ; 522 99 ; 528 14 ; 528 18 ; 528 26 ; 528 32 ; 528 33 ; 528 37 ; 528 38 ;
Abstract

Radiation polymerizable acrylate-functional organopolysiloxanes having the formula ##STR1## where R is a radical selected from monovalent hydrocarbon radicals, substituted monovalent hydrocarbon radicals having from 1 to 20 carbon atoms or monovalent hydrocarbonoxy radicals having from 1 to 20 carbon atoms, or a radical of the formula ##STR2## in which at least one R is a radical having the above formula, R.sup.1 is a divalent radical selected from a saturated divalent hydrocarbon radical having up to 20 carbon atoms, a divalent hydrocarbonoxy radical in which the oxygen is in the form of an ether linkage and an unsaturated divalent hydrocarbon radical having from 3 to 10 carbon atoms; R.sup.2 is hydrogen or a methyl radical; R.sup.3 is a linear or branched radical having 2, 3, 4, 5 or 6 valences in which the radical is selected from a substituted hydrocarbon radical, or a hydrocarbon ether or thioether radical having one or more repeating units and the terminal atoms of the R.sup.3 radical are selected from oxygen or nitrogen; R.sup.4 is a radical linked to the terminal oxygen or nitrogen atoms of R.sup.3 and is selected from the group consisting of a monovalent hydrocarbon radical having from 1 to 20 carbon atoms, an acryloyl radical, and a substituted acryloyl radical and when the terminal atom of R.sup.3 is oxygen, then R.sup.4 may also be hydrogen. R.sup.5 is a monovalent hydrocarbon radical having from 1 to 20 carbon atoms or a radical of the formula


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