The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1986
Filed:
Nov. 21, 1984
Erich Heynacher, Heidenheim, DE;
Carl-Zeiss-Stiftung, Heidenheim, DE;
Abstract
The invention is directed to a method and apparatus for lapping and polishing preferably larger aspheric mirrors such as for astronomical telescopes. The apparatus is in the form of a membrane covering the entire surface to be polished. On the rearward face of the membrane, a plurality of actuators are arranged close to one another and have pressure forces which are individually adjustable. The actuators are stationary relative to the workpiece or perform only small oscillatory movements when compared to the stroke of the lapping tool. With the aid of the actuators, a pressure distribution can be built up over the workpiece which permits different subareas of the workpiece to be removed in different intensities in a single working step.