The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 1986
Filed:
May. 14, 1985
Applicant:
Inventors:
Douglas J Kervin, Mesa, AZ (US);
Carl E Derrington, Tempe, AZ (US);
Assignee:
Motorola, Inc., Schaumburg, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
29572 ; 2957 / ; 357 30 ;
Abstract
A method of manufacturing optically sensitive semiconductor devices in which an anti-reflective coating is provided without the addition of mask or etch steps to the manufacturing process flow. A single layer of silicon nitride is patterned to provide an anti-reflective coating over the active area of the optically sensitive device and to form the dielectric of any capacitors also a part of the integrated circuit. An oxide passivation layer is used so that it may be opened over the active area without disturbing the anti-reflective coating.