The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 1986
Filed:
Nov. 09, 1983
Applicant:
Inventor:
Charles F deMey, II, West Redding, CT (US);
Assignee:
The Perkin-Elmer Corporation, Norwalk, CT (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16K / ;
U.S. Cl.
CPC ...
251215 ; 251187 ; 251229 ; 251300 ; 49 41 ; 74 96 ;
Abstract
A shutter mechanism which includes simultaneous translation of a shutter in two planes of motion prolongs the life of the sealing material of the shutter as well as ensures that, when open, an optical beam passes through a sample compartment without interference or disruption. A further advantage of such a mechanism lies in the positive sealing of a port with sufficient pressure applied via the shutter plate to prevent vapor or fluid communication across the port.
Quick Actions:
deMey, II, Charles. (1986). Shutter mechanism (U.S. Patent No. 4603835). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4603835
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