The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 1986

Filed:

Apr. 19, 1985
Applicant:
Inventors:

Hideo Takeshiba, Hiromachi, JP;

Takao Kinoto, Hiromachi, JP;

Teruomi Jojima, Hiromachi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D / ; A61K / ;
U.S. Cl.
CPC ...
544238 ;
Abstract

Compounds of formula (I): ##STR1## [wherein R.sup.1 and R.sup.3 represent hydrogen or halogen atoms, R.sup.2 represents a hydrogen or halogen atom or a lower alkyl or alkoxy group (provided R.sup.1, R.sup.2 and R.sup.3 are not simultaneously hydrogen), represents a single or double carbon-carbon bond and, where it is a single bond, R.sup.4 represents a group of formula --SR.sup.5 (wherein R.sup.5 represents an optionally substituted alkyl, phenyl, aralkyl or pyridyl group or a lower alkenyl group) and, where it is a double bond, R.sup.4 represents hydrogen] can be prepared by reacting a compound of formula (II): ##STR2## with a compound of formula R.sup.6 H [where R.sup.6 represents a group --SR.sup.5, a group --SR.sup.7 (where R.sup.7 represents a group of formula ##STR3## and Y represents oxygen or sulphur, R.sup.8 and R.sup.9 represent lower alkoxy groups and R.sup.10 represents a lower alkoxy, lower alkyl or phenyl group), a methoxy group or a halogen atom] to give a compound of formula (IV): ##STR4## or, where R.sup.6 represents a methoxy group, a methyl ester thereof; reacting this compound with hydrazine to give a compound of formula (V): ##STR5## and, if necessary, treating the compound of formula (V) with an acid or a base to produce the compound of formula (VI). All of the compounds of formula (I) are valuable antifungal agents and compounds of formula (V) where R.sup.6 represents a group of formula --SR.sup.5 are novel compounds.


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