The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 1986
Filed:
Mar. 28, 1985
Applicant:
Inventors:
Nicholas J Clecak, San Jose, CA (US);
Barbara D Grant, Ossining, NY (US);
Robert D Miller, San Jose, CA (US);
Terry C Tompkins, Los Altos, CA (US);
Carlton G Willson, San Jose, CA (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430192 ; 430141 ; 430170 ; 430189 ; 430193 ; 430270 ; 430302 ; 430326 ; 534550 ; 534558 ; 534560 ; 534561 ;
Abstract
A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
Quick Actions:
Clecak, Nicholas. (1986). High contrast, high resolution deep ultraviolet lithographic resist (U.S. Patent No. 4601969). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4601969
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile