The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 1986

Filed:

Sep. 15, 1983
Applicant:
Inventor:

Yasunobu Kawauchi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F / ; B41B / ;
U.S. Cl.
CPC ...
364491 ; 2504922 ;
Abstract

A mask inspection arrangement is disclosed including a magnetic disc memory for storing pattern data which has been used for operating a mask drawing apparatus, a data producing device for optically scanning a mask drawn by the mask drawing apparatus and producing measured data indicative thereof, a data converter for converting the pattern data from memory into a reference data in the form of dot pattern data for blanking an electron beam in the mask drawing apparatus, and a comparator for comparing the measured data with the reference data and determining a correlation therebetween.


Find Patent Forward Citations

Kawauchi, Yasunobu. (1986). Arrangement for inspecting circuit patterns drawn on a mask (U.S. Patent No. 4600996). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4600996

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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