The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 15, 1986

Filed:

Apr. 22, 1985
Applicant:
Inventors:

Taku Nakamura, Kanagawa, JP;

Mitsunori Hirano, Kanagawa, JP;

Masasi Ogawa, Kanagawa, JP;

Kunio Ishigaki, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430529 ; 430518 ; 430523 ; 430527 ; 430539 ; 430621 ; 430629 ; 430631 ; 430636 ;
Abstract

A photographic light-sensitive material having at least one layer containing a polymer having a repeating unit of the formula (I): ##STR1## wherein A is a monomer unit prepared by copolymerizing copolymerizable ethylenically unsaturated monomers; R.sub.1 is hydrogen or a lower alkyl group having 1 to 6 carbon atoms; Q is ##STR2## (wherein R.sub.1 is the same as defined above) or an arylene group having 6 to 10 carbon atoms; L is a divalent group having 3 to 15 carbon atoms and containing at least one linking group selected from the members consisting of ##STR3## (wherein R.sub.1 is the same as defined above) or a divalent group having 1 to 12 carbon atoms and containing at least one linking group selected from the members consisting of ##STR4## (wherein R.sub.1 is the same as defined above); R.sub.2 is --CH.dbd.CH.sub.2 or --CH.sub.2 CH.sub.2 X (wherein X is a group capable of being substituted with a nucleophilic group or a group capable of being released in the form of HX upon a base; and x and y each represents molar percent, x being between 0 and 99 and y being between 1 and 100. The polymer has a vinylsulfone group or a functional group which is a precursor of a vinylsulfone group fixed in a specific layer of the photographic light-sensitive material and can be used as a mordant, an antistatic agent or other various photographic additives.


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