The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 1986
Filed:
Jan. 14, 1985
Applicant:
Inventors:
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
2041 / ; 204298 ;
Abstract
There have been known various methods for controlling the magnetic anisotropy of a magnetic film with a magnetic field being applied thereto. In accordance with the present invention, the magnetic anisotropy is controlled by implanting ions into the magnetic film while applying a magnetic field thereto. The direction for applying the magnetic field can be arbitrarily selected, for example, along an inplane direction of the magnetic film and along a direction vertical thereto. The magnetic anisotropy can be controlled only in the desired areas by limiting the areas to which ions are implanted with a mask disposed on the magnetic film.