The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 08, 1986
Filed:
Oct. 03, 1984
Applicant:
Inventors:
Constance J Araps, Wappingers Falls, NY (US);
Steven M Kandetzke, Fishkill, NY (US);
Ellen L Kutner, Poughquag, NY (US);
Mark A Takacs, Poughkeepsie, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 2957 / ; 29580 ; 29591 ; 156646 ; 156648 ; 156653 ; 156655 ; 156657 ; 1566591 ; 156662 ; 156668 ; 2041 / ; 2041 / ; 357 49 ; 357 65 ; 427 93 ; 427 94 ;
Abstract
A method of fabrication of semiconductor structures which utilize trenches filled with polymeric dielectric materials to isolate segments thereof is disclosed. Contamination of the polymeric dielectric during processing of structural segments is avoided by filling the trenches with disposable polymer through formation of conductive patterns upon the structure, with subsequent removal of the disposable polymer and replacement with the desired polymeric dielectric.