The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 01, 1986
Filed:
Oct. 09, 1984
Donald R Boys, Cupertino, CA (US);
IODEP, Inc., San Jose, CA (US);
Abstract
A composite sputtering target is provided which is constructed of a non-magnetic sputtering material bonded to a magnetic backing material. A magnetic field is provided through the backing material by a magnetic system, so that the backing material and magnetic system form a closed flux path. During sputtering the magnetic system is operated at a high enough field strength to saturate the backing plate. This saturation causes a fringing field over the non-magnetic target similar to that obtained with magnetic target systems. In another embodiment, the return path for magnetic flux beneath the target material is a permanent part of the magnetic system instead of being permanently attached to the target material as a backing for support.