The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 1986
Filed:
Nov. 07, 1984
Hans Schupp, Wachenheim, DE;
Albert Elzer, Otterstadt, DE;
BASF Aktiengesellschaft, , DE;
Abstract
In the production of imagewise structured resist layers, for example for the manufacture of printed circuits, electronic components, soldering masks, etc., by application, onto a substrate, of a positive-working resist layer (R) which can be rendered soluble by exposure to actinic light, imagewise exposure of the resist layer (R) to actinic light and removal of the exposed parts of the layer by washing out with a developer, the photosensitive resist layer (R) used, in particular in the form of a dry film resist, consists of two or more strata (S) which posses different basic solubilities, at least the upper stratum (U) being photosensitive and the lower stratum (LS) having a higher basic solubility in the developer than has the upper stratum (U).