The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 1986
Filed:
Nov. 01, 1984
Yoshio Nakai, Iwakuni, JP;
Masamitsu Tateyama, Yamaguchi, JP;
Mitsubishi Rayon Company, Ltd., Tokyo, JP;
Abstract
Disclosed is an impact-resistant methacrylic resin composition which comprises a graft copolymer [II] obtained by polymerizing 10 to 900 wt. parts of a monomer or monomeric mixture (B) comprising 80 to 100 wt. % methyl methacrylate and 20 to 0 wt. % of at least one vinyl or vinylidene monomer copolymerizable therewith in the presence of 100 wt. parts of an acrylic elastomer [I] obtained by polymerizing monomeric mixture (A) comprising 9.9 to 29.9 wt. % of styrene and/or its derivative, 70 to 90 wt. % of at least one alkyl (C2-8) acrylate, 0.1 to 5 wt. % of at least one monomer represented by the formula: ##STR1## and 0 to 5 wt. % of a crosslinkable copolymerizable monomer having at least 2 carbon-to-carbon double bonds. This graft copolymer [II] may be used in combination with a methacrylic resin [III] obtained by polymerizing a monomer or monomeric mixture (C) comprising 80 to 100 wt. % methyl methacrylate and 20 to 0 wt. % of at least one copolymerizable vinyl or vinylidene monomer. The impact-resistant resin composition has excellent transparency and weatherability and a good surface gloss.