The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 17, 1986
Filed:
Oct. 09, 1984
Wai C Wong, Hong Kong, HK;
Abstract
A double-exposure prevention system for a still camera having a cockable spring-biased linear movable shutter-actuating slider operable between a cocked condition and held thereat by a latch movably responsive to a manually operated release member and thereafter upon release of the latch to a shutter-actuating position is provided with means for allowing one end of the slider to be rotated out of and away from the axis of the shutter-actuating movement throughout most of the subsequent rewind operation. While in this second angular position, the slider disables the operation of the release member, preventing accidental tripping of the latch after a cocking condition has been restored. During a small terminal portion of the film advance and after the preceding frame has been safely advanced so as to be out of the way, the film advance mechanism then rotates the slider back to its initial position. In the preferred form of the invention, these features are accomplished by modifying the location and configuration of a conventional non-safetied shutter release system. No additional parts are necessary.