The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 1986
Filed:
Oct. 26, 1983
Applicant:
Inventor:
Joseph J Hanak, Lawrenceville, NJ (US);
Assignee:
RCA Corporation, Princeton, NJ (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118719 ; 118723 ; 118724 ; 118725 ; 118728 ; 118729 ; 118733 ; 118 501 ; 118500 ;
Abstract
A continuous, in-line deposition system is disclosed for coating large substrates. The apparatus includes loadlock chambers for loading and unloading substrates arranged in carriers. The carriers transport through the apparatus a plurality of pairs of substrates with their principal faces, that is faces to be coated, held in a plane that is both parallel to the electric field of the glow discharge reaction and perpendicular to the direction of motion of the substrates through the apparatus.
Hanak, Joseph. (1986). Continuous in-line deposition system (U.S. Patent No. 4593644). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4593644
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile