The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 03, 1986

Filed:

Oct. 15, 1985
Applicant:
Inventors:

Yoshitake Ohnishi, Tokyo, JP;

Takeshi Endo, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430313 ; 430270 ; 430310 ; 430314 ; 430325 ; 526284 ;
Abstract

A process for fabrication of resist comprising a substrate and an overlying radiation sensitive layer, said overlying layer consisting essentially of a specific polymer or copolymer of vinylnaphthalene.


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