The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 1986
Filed:
Jun. 20, 1984
Peter L Young, South Barrington, IL (US);
Modest M Oprysko, Roselle, IL (US);
Mark W Beranek, Arlington Heights, IL (US);
Gould Inc., Rolling Meadows, IL (US);
Abstract
A method for repairing clear defects on a photomask. The method includes the steps of coating the photomask with a positive photoresist; exposing the photoresist to a laser beam for localized heating thereof to a temperature above 500.degree. C. to darken or char the polymer; and removing the unexposed polymer from the photomask. The method may also include the intermediate step of heating the polymer to a temperature between 200.degree. C. and 500.degree. C. to brown the polymer before the polymer is exposed to the laser which heats it to a temperature above 500.degree. C.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile