The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 1986
Filed:
Sep. 20, 1983
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A method for manufacturing film without melt fracturing in which a flow of a polymer solution having a high viscosity extruded from a die slit onto a running and spreading plane is extruded through the die slit together with a low viscosity solution with the polymer solution is covered by the low viscosity solution. In a first preferred embodiment, the low viscosity solution is passed through a confluence tube so as to surround the high viscosity solution in the form of a coaxial cylinder after which the two solutions are passed through a slit die which maintains the covering relationship between the high and low viscosity solutions. In another preferred embodiment, a slit die is provided which has a central passage into which the high viscosity fluid is supplied and side passages of a slit-like shape similar to that of the main passage into which the low viscosity solution is supplied.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile