The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 03, 1986
Filed:
Aug. 09, 1984
Applicant:
Inventors:
Shinichi Hara, Hitachi, JP;
Shinji Narishige, Mito, JP;
Tsuneo Yoshinari, Hitachi, JP;
Mistuo Sato, Takahagi, JP;
Katsuya Mitsuoka, Hitachi, JP;
Makoto Morijiri, Hitachi, JP;
Masanobu Hanazono, Mito, JP;
Tetsuo Kobayashi, Kanagawa, JP;
Assignee:
Computer Basic Technology Research Association, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156652 ; 156656 ; 1566591 ; 156667 ; 2041 / ; 360110 ;
Abstract
A method of patterning a thin film by dry etching is disclosed in which, in order for a thin alumina film to have a predetermined pattern, the thin alumina film is selectively removed by carrying out the ion beam etching which uses a carbon fluoride gas, while using a photoresist film as a mask.